Highly thermal robust Ni-germanosilicide utilizing NiPt/Co/TiN tri-layer for CMOS application

Janggn Yun,Soonyoung Oh,Heehwan Ji,Binfeng Huang,Seonghyung Park,Daebyung Kim,Uisik Kim,Hanseob Cha,Sangbum Hu,Jeonggun Lee,Hideok Lee

ieee（2004）

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摘要

Highly thermal robust Ni-germanosilicide has been developed using the novel NiPt/Co/TiN tri-layer. Ni-germanosilicide properties were characterized with different source/drain dopants and Ge concentrations for nanoscale CMOSFETs application. The sheet resistance was degraded as the Ge concentration increases in Si1-xGex. Low temperature silicidation and wide range of RTP process window are achieved as well as the improvement of the thermal stability according to different dopant types by the subsequent Co and TiN capping layer above NiPt on Si1-xGex.

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关键词

ge-si alloys,mosfet,x-ray photoelectron spectra,cobalt,multilayers,nanoelectronics,nickel alloys,nickel compounds,platinum alloys,rapid thermal annealing,semiconductor materials,thermal stability,titanium compounds,cmos application,co capping layer,ge concentration,nigesi-nipt-co-tin,nipt-co-tin trilayer,rtp process,tin capping layer,drain dopant,low temperature silicidation,nanoscale cmosfet application,sheet resistance,source dopant,thermal robust ni-germanosilicide

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