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65 Nm Device Manufacture Using Shaped E-Beam Lithography

L Pain,M Jurdit,Y Laplanche,J Todeschini,H Leininger,S Tourniol,R Faure,X Bossy,R Palla,A Beverina,M Broekaart,F Judong,K Brosselin,L Depoyan,Y Le Friec,F Leverd,V De Jonghe,E Josse,O Hinsinger,P Brun,D Henry,M Woo,P Stolk,B Tavel,F Arnaud

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS（2004）

引用 14|浏览51
关键词
e-beam lithography,photoresist,prototyping,SRAM
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