Measurement of field-induced refractive index variation in GaAs/AlGaAs superlattice using monolithic Fabry-Perot etalon

Electronics Letters  (1991)

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摘要
The electrorefractive effect in a GaAs/AlGaAs superlattice was measured by using a monolithic Fabry-Perot structure, where the superlattice active region is embedded inside a cavity, formed by two quarter-wave stacks, all grown by molecular beam epitaxy. At the wavelength approximately 7675 AA, there is a large absorption change ( approximately 5400/cm) and an accompanying index change ( approximately 0.015) when the applied field change is approximately 100 kV/cm. In addition, the chirp parameter at this wavelength is less than 1. This result shows that superlattice electroabsorption optical modulation can offer relatively very low chirp.
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III-V semiconductors,aluminium compounds,electroabsorption,gallium arsenide,optical modulation,refractive index measurement,semiconductor superlattices,GaAs-AlGaAs,MBE,cavity,chirp parameter,electro-optical effect,electrorefractive effect,field-induced refractive index variation,molecular beam epitaxy,monolithic Fabry-Perot etalon,quarter-wave stacks,superlattice active region,superlattice electroabsorption optical modulation
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