Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform

Shankar Kumar Selvaraja,Peter De Heyn,Gustaf Winroth,Patrick Ong,G Lepage, Celine Cailler,Arnaud Rigny,K K Bourdelle, D Vanthourhout,Joris Van Campenhout,P Absil

Optical Fiber Communications Conference and Exhibition（2014）

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摘要

Using an advanced 300mm CMOS-platform, we report record-low and highly-uniform propagation loss: 0.45±0.12dB/cm for wires, and 2dB/cm for slot waveguides. For WDM devices, we demonstrate channel variation(3-σ) within-wafer and within-device of 6.1nm and 1.2nm respectively.

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关键词

cmos integrated circuits,elemental semiconductors,integrated optics,optical losses,optical waveguides,silicon,wavelength division multiplexing,wires,cmos platform,si,channel variation,highly uniform passive silicon photonics devices,low-loss passive silicon photonics devices,propagation loss,size 300 mm,size 6.1 nm to 1.2 nm,slot waveguides,wavelength-division multiplexing devices,waveguides

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