Bias voltage controlled positive magnetoresistance of Fe 0.05-C0.95/si heterostructures

Chinese Physics Letters(2009)

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摘要
Fe-doped amorphous carbon films of about 100 nm in thickness are deposited on n-type silicon substrates by pulsed laser deposition (PLD), and positive magnetoresistance (MR) is observed for these Fe-doped amorphous carbon/n-Si heterostructures under current-perpendicular-to-plane configuration at forward bias. Two MR peaks are observed in the temperature range 40-120 K and the positive MR varies with applied bias voltage. This bias voltage controlled MR may be related to the magnetic-field-controlled freeze out effect and recombination through the deep trapping states in the Fe-doped carbon films. © 2009 Chinese Physical Society and IOP Publishing Ltd.
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