Single-chamber deposition of intrinsic microcrystalline silicon thin film and its application in solar cells

To obtain high efficiency microcrystalline silicon solar cell in single chamber, a series of intrinsic microcrystalline silicon thin films were prepared by very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) at different deposition conditions. The structural and electrical properties of these films were researched. Based on the experience of device grade intrinsic microcrystalline silicon used in multi-chamber, through the choice of suitable intrinsic layer and p seeding layer technique, the single junction microcrystalline silicon solar cell with 6.23% (1 cm 2) conversion efficiency has been fabricated in single chamber.