Free-Standing Su-8 Gratings Fabricated By Sacrificial Layer-Assisted Uv Curing Imprint

We present results on the nanofabrication of high density patterns in SU-8 resist, based on nanoimprinting combined with UV curing. The bilayer process using PMMA as sacrificial layer was developed to release the SU-8 layer to form three dimensional structures. The SU-8 displays excellent imprint property and well defined patterns are achieved at at low temperature, low pressure after demolding process. Using this technology, 300nm period SU-8 subwavelengh gratings and nanochannels were fabricated on flat substrate with good fidelity. This sacrificial layer-assisted UV curing imprint technology offers versatility and flexibility to stack polymer layers and sealed fluidic channels.