Effects Of Heat Treatment On Luminescence Of Er-Doped Silicon-Rich Sio2 Prepared By Rf Co-Sputtering

Er-doped silicon-rich SiO2 thin films were prepared by an rf co-sputtering method, followed by thermal annealing at 700-1200degreesC for 30 min. The microstructure is studied by transmission electron microscopy (TEM) and x-ray diffraction (XRD). When the films are annealed at T > 900degrees C, silicon nanocrystals (nc-Si) enveloped by amorphous silicon (alpha-Si) can be observed. The thermal quenching behaviour at lambda = 1.535 mum and its relation with the annealing temperature are also investigated. With the increasing annealing temperature, the portion of alpha-Si and the intensity quenching both decrease. Efficient luminescence from Er ions and weak intensity thermal quenching can be obtained from the sample annealed at 1100degrees C. The role of alpha-Si in the non-radiative processes at T > 100 K is discussed.