Effect of sputtering pressure on the properties of ZnMgO: Ti transparent conducting thin films

ZnMgO: Ti transparent conducting thin films have been deposited on glass substrates by DC-magnetron sputtering, and the effects of sputtering pressure on their properties have been investigated. Electrical resistivity as low as 7.84*10−4Ω cm was achieved for ZnMgO: Ti thin film. All thin films provided high optical transparencies in the visible region. Thin films deposited at 6 Pa, 8 Pa and 10 Pa showed “blue shift”. These results have not only clarified the effects of the sputtering pressure on the properties of ZnMgO: Ti films, but also revealed the potential of ZnMgO: Ti films in solar cells application. Efficiency of solar cells may be improved by choosing ZnMgO: Ti thin film as transparent electrode.