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Using LV Process to Design High Voltage DDDMOSFET and LDMOSFET with 3-D Profile Structure

International Symposium on Power Semiconductor Devices and IC's(2013)

Cited 2|Views7
Key words
CMOS integrated circuits,MOSFET,integrated circuit design,3D profile structure,DDDMOSFET,LDMOSFET,LV process,PW-NW junction,breakdown voltage enhancement,double diffused drain MOSFET,island patterns,lateral double diffused MOSFET,layout skills,slot patterns,standard low voltage CMOS technology,three dimensional fish bone patterns,voltage 10 V,voltage 5 V,voltage 60 V
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