Evaluation of RF Capacitance Extraction for Ultrathin Ultraleaky SOI MOS Devices

Chuanzhao Yu, J. Zhang,J. S. Yuan, F. Duan, S. K. Jayanarananan, A. Marathe,S. Cooper,V. Pham,J.-S. Goo

IEEE Electron Device Letters(2007)

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摘要
This letter evaluates a radio-frequency (RF) method to extract the gate capacitance for SOI MOSFETs with ultrathin ultraleaky gate dielectrics. Conventional methods such as two-element and three-element methods using precision impedance analyzer were also compared. The RF method scans the RF capacitance data, assesses its lower and upper limits, and extracts the SOI gate capacitance accurately ind...
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关键词
Radio frequency,MOS devices,Contact resistance,Dielectric substrates,MOSFETs,Data mining,Impedance,Frequency measurement,Capacitance measurement,Leakage current
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