A Novel Fuzzy Matching Model For Lithography Hotspot Detection

In advanced IC manufacturing, as the gap between lithography optical wavelength and feature size increases, it becomes challenging to detect problematic layout patterns called lithography hotspot. In this paper, we propose a novel fuzzy matching model which can dynamically tune appropriate fuzzy regions around known hotspots. Based on this model, we develop a fast algorithm for lithography hotspot detection with very low chances of false-alarm. Our results are very encouraging with under 0.56 CPU-hrs/mm(2) runtime.