Cross-Layer Modeling and Simulation of Circuit Reliability

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems(2014)

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摘要
Integrated circuit design in the late CMOS era is challenged by the ever-increasing variability and reliability issues. The situation is further compounded by real-time uncertainties in workload and ambient conditions, which dynamically influence the degradation rate. To improve design predictability and guarantee system lifetime, accurate modeling, and simulation tools for reliability are essential to both digital and analog circuits. This paper presents cross-layer solutions for emerging reliability threats, including: 1) device-level modeling of reliability mechanisms, such as transistor aging and its statistical behavior; 2) circuit-level long-term aging models that capture unique operation patterns in digital and analog design, and directly predict the degradation; and 3) simulation methods for very-large-scale designs. Built on the long-term model, the new methods significantly enhance the accuracy and efficiency of reliability analysis. As validated by silicon data, these solutions close the gap between the underlying reliability physics and circuit/system design for resilience.
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关键词
degradation rate,analog circuits,integrated circuit reliability,reliability mechanisms,integrated circuit modelling,circuit reliability simulation,circuit-level long-term aging models,cross-layer modeling,reliability modeling,digital circuits,bias temperature instability,real-time uncertainties,long-term model,cmos integrated circuits,device-level modeling,cmos era,integrated circuit design,very-large-scale designs,cross-layer solutions,statistical behavior,silicon data,transistor aging,system lifetime,circuit simulation
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