0.2 Mu M Gate Length, Non-Alloyed P+-Alinas/N-Alinas/Gainas Jhemts With F(T)=62ghz
ELECTRONICS LETTERS(1996)
摘要
Recently, the authors demonstrated improved breakdown characteristics in 1 mu m gate length P+-AllnAs/N-AllnAs/GalnAs JHEMTs utilising a junction to modulate the 2-DEG and regrowth of the ohmic contact regions by MOCVD. The authors present high frequency operation (f(t) and f(max) of 62 and 105 GHz respectively) of 0.2 mu m devices with high current (500mA/mm), transconductance (300mS/mm) such improved breakdown characteristics (two- and three-terminal gate breakdown voltages of 19 and 16V, respectively).
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关键词
high electron mobility transistors, aluminium gallium arsenide, gallium indium arsenide, semiconductor device characterisation
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