A Novel Method of MOSFET Series Resistance Extraction Featuring Constant Mobility Criteria and Mobility Universality

Electron Devices, IEEE Transactions(2010)

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摘要
A method of MOSFET series resistance extraction is established in this paper. The core of this method relies on the constant mobility criteria, while for different gate lengths, it preserves the shape of universal mobility curves in the high-vertical-field regime. Consequently, the series resistance of a MOSFET can be extracted in an analytical and self-consistent manner, achieved without the knowledge of the gate oxide thickness, channel length, channel doping, or channel stress. Reasonable values of extracted series resistance are demonstrated in a wide range of gate length. Technology computer-aided design simulation further corroborates the validity of the proposed method, particularly for devices with heavily doped source/drain extensions. The constant mobility criteria with respect to the bulk charge linearization coefficient are also verified.
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关键词
series resistance,charge linearization coefficient,channel stress,computer-aided design simulation,constant mobility criteria,high-vertical-field regime,universal mobility curves,gate oxide thickness,circuit cad,universal mobility,mosfet,mobility universality,mosfet series resistance extraction,shape,degradation,resistance,feature extraction,stress,computational modeling,length measurement,design automation,technology computer aided design,doping,strain,voltage,logic gates,silicon
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