Enhancement-Mode InGaAs/InAlAs/InP High Electon Mobility Transistor with 0.1 µm Gate

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS(2002)

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摘要
We present state-of-the-art performance of 0.1 mum gate enhancement-mode (E-mode) InGaAs/InAlAs/InP high electron mobility transistors (HEMTs) fabricated on 3-inch wafers in a production environment. The E-mode HEMTs have transconductance of 1180 mS/mm, cutoff frequency of 210 GHz, and less than 1 mA/mm I-dss (drain current at a gate bias of zero volts), measured at a drain bias of I V. The device characteristics make. the E-mode HEMTs suitable candidates for ultra-high-speed analog and digital applications. Enhancement-mode HEMT devices and low noise amplifiers utilizing E-mode HEMTs, which were fabricated on 3-inch wafers in TRW's InP production line, demonstrated excellent repeatability, performance, yield, and uniformity.
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关键词
InGaAs,InAlAs,InP,HEMT,MMIC
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