Layout-Aware Variability Characterization Of Cmos Current Sources

IEICE TRANSACTIONS ON ELECTRONICS(2012)

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摘要
Current sources are essential components for analog circuit designs, the mismatch of which causes the significant degradation of the circuit performance. This paper addresses the mismatch model of CMOS current sources, unlike the conventional modeling, focusing on the layout- and lambda-dependency of the process variation, where lambda is the output conductance parameter. To make it clear what variation parameter influences the mismatch, we implemented a test chip on 90 nm process technology, where we can collect the characteristics variation data for MOSFETs of various layouts. The test chip also includes D/A converters to check the differential non-linearity (DNL) caused by the mismatch of current sources when behaving as a DAC. Identifying the variation and the circuit-level errors in the measured DNLs, we reveal that our model can more accurately account for the current variation compared to the conventional mismatch model.
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关键词
process variation, current mismatch, layout-dependent variation, analog DFM
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