100 nm gate AlGaN/GaN HEMTs on silicon with fT=90 GHz

Electronics Letters(2009)

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摘要
The realisation of 0.1 mum gate AlGaN/GaN high electron mobility transistors grown on high-resistivity silicon substrates is reported. A maximum current density of 750 mA/mm and an extrinsic transconductance of 225 mS/mm are achieved. The devices feature a record current gain cutoff frequency as high as f T=90 GHz, the highest value ever reported from a GaN-based device grown on a silicon substrat...
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关键词
aluminium compounds,gallium compounds,high electron mobility transistors,III-V semiconductors,millimetre wave transistors,silicon,substrates,wide band gap semiconductors
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