Temperature dependence of Pd thin film cryo resistors

A Satrapinski,O Hahtela,A M Savin,S V Novikov,Nataliya A Lebedeva

Instrumentation and Measurement, IEEE Transactions（2010）

引用 6|浏览24

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摘要

Cryo resistors based on Pd thin films were designed and investigated in temperature range 50 mK - 300 K. The resistors in the range 100 kΩ - 1.3 MΩ were fabricated using thermal evaporation technique. Minimum temperature coefficient, -0.4 (37)·10-6/K, in temperature range 50 mK - 100 mK has been obtained for 20 nm thin film 560 kΩ resistor. Binary and decimal configuration of connection of resistive elements were used for flexible adjustment of resistance value.

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关键词

cryogenic electronics,palladium,thin film resistors,pd,pd thin film cryo resistors,minimum temperature coefficient,resistance 100 kohm to 1.3 mohm,resistive elements,size 20 nm,temperature 50 mk to 100 mk,temperature 50 mk to 300 k,temperature dependence,thermal evaporation technique,resistors,films,resistance,thin film,temperature measurement,conductivity,thermal resistance,transistors

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