X-Ray Photoelectron Spectroscopy Study of Junction Interface in In/BaRbBiO Films

Fumihiko Toda,Tomoyuki Yamada,Satoru Kishida,Heizo Tokutaka

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS（2014）

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摘要

The In/BRBO/STO specimens were fabricated by depositing Ba0.6Rb0.4Bi1.0Oy (BRBO) on the SrTiO3 (STO) substrates by means of molecular beam epitaxy using 100% pure ozone and then, by depositing In metal. From the X-ray photoelectron spectroscopy results, we found that the In metal deposited on the BRBO/STO specimen removed the oxygen from BRBO and produced InOx layer at the interface between In metal and BRBO.

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关键词

BRBO film,three-terminal device,X-ray photoelectron spectroscopy,chemical state analysis,superconductor,native barrier

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