An Asymmetric SRAM Cell to Lower Gate Leakage

ISQED(2004)

引用 47|浏览18
暂无评分
摘要
We introduce a new Static Random Access Memory (SRAM) cell that offers high stability and reduces gate leakage power in caches while maintaining low access latency. Our design exploits the strong bias towards zero at the bit level exhibited by the memory value stream ofordinary programs. Compared to conventional symmetric high-performance cell, our new cell reduces total leakage by more than 24% in the zero state at high temperature. With one cell design, total cache leakage is reduced by 24% at high temperature with no performance or stability loss. At low temperatures, where gate leakage is dominant, our cell reduces total cache leakage by 43%. We show that the new cell can be combined in an orthogonal fashion with asymmetric dual-Vt cells to lower both gate and subthreshold leakage, reducing total leakage by 45% to 60% with comparable performance and stability.
更多
查看译文
关键词
total leakage,asymmetric sram cell,new cell,total cache leakage,gate leakage power,gate leakage,lower gate leakage,subthreshold leakage,conventional symmetric high-performance cell,cell design,high temperature,asymmetric dual-vt cell,tunneling,temperature,cmos technology,power dissipation,stability,voltage,static random access memory
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要