Defect Tolerance After the Roadmap

IntroductionOptical photolithography techniques are approaching physical and economic limits that will drasticallyreduce the current scaling rate of device miniaturization. New technologies being investigatedinclude Next Generation Lithography (NGL) and Chemically Assembled Electronic Nanotechnology(CAEN), which hold the promise of extremely high densities and sub-10nm feature sizes.However, these technologies are likely to have significantly higher defect densities than currentones....