Super-Resolution Bright-Field Nanometer Topographic Optical Microscopy Based On Contrast

By using an expectation-maximization maximum likelihood estimation algorithm to improve the lateral resolution of a recently developed non-interferometric wide-field optical profilometer, we obtain super-resolution bright-field optical images of nanometer features on a flat surface. The optical profilometer employs a 365-nm light source and an ordinary objective lens of a 0.95 numerical aperture. For objects of 100 nm thickness, lateral features about lambda/7 can be resolved in the restored images without fluorescence labeling. Current image acquisition rate is 0.1 frame/sec, which is limited by the brightness of the light source. With a brighter light source, the imaging speed can be fast enough for real-time observation of dynamic activities in the nanometer scale. (C) 2005 Wiley-Liss, Inc.