The study of optical and microstructural evolution of Ta2O5 and SiO2 thin films by plasma ion assisted deposition method

Wen-Jen Liu,Xing-Jian Guo,Chia-Hung Chien

Surface and Coatings Technology（2005）

引用 21|浏览8

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摘要

The influences of deposition rate and thermal annealing on the surface roughness, optical properties, and microstructural evolution of single Ta2O5 and SiO2 thin films deposited on D263T quartz glass substrates using plasma ion assisted deposition (PIAD) were investigated in this study.

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关键词

Electron beam evaporation,Ion bombardment,Atomic force microscopy,Transmission electron microscopy,Silicon oxide,Dense wavelength division multiplexing

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