CxFy polymer film deposition in DC and RF fluorinert vapor plasmas

Polymer films containing CxFy have been deposited in Fluorinert vapor (C7F16) plasmas. The spatial and temporal evolution of optical emission of CF2 and C-2 radicals was monitored and kinetics of the C7F16 decomposition process was discussed. The films were deposited on stainless steel, glass, molybdenum and silicon wafers at room temperature with the vapor pressures, 40 and 100 Pa. Electrical properties such as the breakdown voltage and dielectric constant as well as the structure of the films were analyzed. The composition and characteristics of the films were determined by Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy techniques, scanning electron microscopy and electron spin resonance spectroscopy. (C) 2000 Elsevier Science Ltd. All rights reserved.