Advanced Multilayer Systems for X-ray Optics: Quality Assessment by TEM
msra(2008)
摘要
Precisely engineered systems of nanoscale multilayers are essential device components in X-ray optics for spectrometry and
in synchrotron applications. Their fabrication and optimization require processing control by high-resolution microstructure
characterization. Methods of TEM have proven to be indispensable in quantitatively assessing properties like multilayer periodicity,
orientation, or interface roughness, and in correlating the microstructure with X-ray reflectivity [1, 2].
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关键词
multilayers, X-ray optics, TEM, Geometric Phase Analysis
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