Investigation of Body Bias Dependence of Gate-Induced Drain Leakage Current for Body-Tied Fin Field Effect Transistor

JAPANESE JOURNAL OF APPLIED PHYSICS(2008)

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摘要
The body bia: dependence of gate-induced drain leakage (GIRL) current for a fin field effect transistor fabricated on a bulk Si wafer (bulk FinFET) is investigated. The local damascene (LD) bulk FinFET is measured under various bias conditions and the effect of the body-bias-induced lateral electric field oil GIDL current is evaluated. A lateral elcctric field shield effect under fin depleted condition is proposed and it is validated by the three-terminal band-to-band tunneling current model. The GIRL current of the bulk FinFET call be reduced by reducing the body bias, and an improvement in retention characteristics is expected.
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关键词
fin field effect transistor (FinFET),bulk FinFET,dynamic random access memory (DRAM),cell transistor,gate-induced drain leakage (GIDL),lateral electric field,body bias
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