Investigations on a nitriding process of molybdenum thin films exposed to (Ar–N2–H2) expanding microwave plasma

I. Jauberteau,J.L. Jauberteau,P. Goudeau,B. Soulestin,M. Marteau,M. Cahoreau,J. Aubreton

Surface and Coatings Technology（2009）

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摘要

Nitriding treatments using various (Ar–N2–H2) gas mixtures are performed on thin molybdenum films coated on Si (100) substrates, in an expanding microwave plasma reactor.

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关键词

Molybdenum nitride,Expanding plasma,Film structure,Nitrogen diffusion,EEDF

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