Nucleation and growth of Ni-LIGA layers
Microsystem Technologies-micro-and Nanosystems-information Storage and Processing Systems(1996)
摘要
The quality of a Ni-LIGA layer and its adhesion to TiO2 depend crucially on interface morphology and chemistry. The unique combination of ARXPS (angle resolved photo electron spectroscopy),
STM (Scanning tunnel microscopy) and DTS (distance tunnel spectroscopy) yield new insights in morphology and stoichiometry
on the porous TiO2 plating ground, on the TiO
2-x
(OH)
y
NiO
z
Ni interface, and on the Ni-nucleation and growth. Aside TiO2-pore dimension, we identified graphite hillocks, with retarded Ni coverage, the adhesion promoting interface oxide TiO
2-x
(OH)
y
Ni
z
and the Ni nuclei and their expansion.
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关键词
scanning tunneling microscopy
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