Preparation of Lithium Niobate Thin Film by Thermal Chemical Vapor Deposition

Polycrystalline LiNbO3 films were prepared using the metalorganic compounds, Li(DPM) and Nb(OC2H5)(5), by thermal chemical vapor deposition at 5 Torr in the temperature range of 873-1023 K. The range of operation conditions for pure LiNbO3 growth using Nb(OC2H5)(5) is wider than that using Nb(DPM)(2)Cl-3 as the Nb source. The distribution of growth rate in the reactor and that of step coverage in chemical-vapor-deposited LiNbO3 are governed by the Nb2O5 growth process, and the reactivity of Nb(OEt)(5) is considerably higher than that of Nb(DPM)(2)Cl-3.