Modelling of Hot Electron Effects in GaN/AlGaN HEMT with AlN Interlayer

SISPAD 2007: SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES 2007(2007)

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摘要
Physics-based numerical simulation of an AlGaN/GaN HEMT with additional AIN interlayer (IL) is carried out using both the drift-diffusion (DD) and hydrodynamic (HD) transport models. Assuming that free electrons are supplied by donor-like surface traps (STs) at the top of the AlGaN layer, we show that the AIN IL increases the 2D electron gas density and reduces the ST occupation. The HD model correctly describes ST recharging due to heating of the channel electrons and subsequent thermionic emission into the AlGaN layer. This recharging has a strong effect on channel transport, leading to the creation of a depletion domain, which expands towards the drain with increasing drain bias. The DD model does not include this effect and the depletion region remains unchanged as the drain bias increases.
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关键词
High Electron Mobility Transistor, AlGaN Layer, Longitudinal Electric Field, Semiconductor Process, Drain Bias
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