An Analytical Drain Current Model Of Short-Channel Mosfets Including Source/Drain Resistance Effect
INTERNATIONAL JOURNAL OF ELECTRONICS(2006)
摘要
In this paper, the DC characteristics of MOSFETs are investigated by means of an analytical approach with considerations of the source/drain parasitic resistance (R-S/R-D). Experimental data of MOS devices for DRAM design and results of TCAD simulation are used to verify the accuracy of theoretical calculation. It is found that both the R-S and R-D can induce a large reduction in the drain current in the linear region, but only the source resistance can cause a large reduction in the drain current in the saturation region. Moreover, the drain current deduction due to the R-S/R-D increases with decreasing channel length and oxide thickness.
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关键词
drain current, source/drain parasitic resistance, reverse short channel effect (RSCE), velocity saturation, channel length modulation (CLM), drain-induced barier lowering (DIBL)
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