Full copper wiring in a sub-0.25 micro-m CMOS ULSI technologyD. Edelstein, J. Heidenreich,R. Goldblatt,W. Cote,C. Uzoh,N. Lustig,P. Roper,T. Mcdevitt, W. Motsiff,A. Simon,J. Dukovic,R. Wachnik,H. Rathore,R. Schulz,L. Su,S. Luce,J. Slatterymsra(1997)引用 56|浏览39暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要