Fabrication of CNT field-emitter array using a polymer insulator

The fabrication process of a carbon-nanotube (CNT) field-emitter array (FEA) having a polymer insulator is reported. This polymer material is suitable for a large-sized FEA because of its coating property and thermal stability. These features contribute to the display-image uniformity, the tolerance to the thermal-sealing process, etc. A new method of forming via holes on the insulator instead of gate holes has been developed. The method uses a spin-wet-etching (SWE) technique instead of the typical reactive-ion-etching (RIE) method. The RIE method damages and contaminates the CNT at the end of the etching process. However, the SWE technique ensures fine gate hole configurations with little under-cut without any damage nor contamination. An FEA panel 1.5 in. on the diagonal was fabricated by using the method. The FEA showed good emission uniformity with proper surface treatment of the CNT.