Influence of nickel thickness on the properties of ITO/Ni/ITO thin films

ITO single-layer and ITO/Ni/ITO (INI) multilayer films were deposited by reactive magnetron sputtering on unheated polycarbonate (PC) substrates. The influence of the Ni interlayer on the structural and optoelectrical properties of the film composite was investigated by keeping the thickness of ITO and INI films at 100 and 50/5/45nm, respectively.