Design Of Active Inductors In Sige/Sige : C Processes For Rif Applications

INTERNATIONAL JOURNAL OF RF AND MICROWAVE COMPUTER-AIDED ENGINEERING(2007)

引用 3|浏览5
暂无评分
摘要
Applicability of silicon-based heterojunction bipolar processes is investigated for designing active inductors with high quality factors (Q). Results for grounded type one-port active inductor incorporating frequency-dependent as well as frequency-independent negative resistances are examined. Later, the negative resistance aspect is extended from one-port to two-port active inductor circuit to ensure its use as a series element. The enhanced Q-values of all the inductive circuits are observed in accordance with the theory. Moderately high-Q values (similar to 100) with considerable inductances (similar to 0.2-1 nH) are obtained in the RF frequency ranges (similar to 5-9 GHz). (c) 2007 Wiley Periodicals, Inc.
更多
查看译文
关键词
bipolar active inductor, high-Q, one-port, two-port, SiGe/SiGe : C, HBTs, RF applications
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要