Bitline contacts in high density SRAMs: design for testability and stressability

ITC(2001)

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摘要
Process scaling and the need for smaller SRAM cellschallenges process technologies to make millions of robustand reliable bitline contacts on a single chip. Anotherchallenge is to identify marginal, resistive and unreliablebitline contacts given the inherent electrical characteristicsof the SRAM cell. This paper describes two designtechniques that improve the screenability and stressabilityof bitline contacts in high-density SRAMs. Thesetechniques are developed to overcome the lack ofdetectability of resistive bitline contacts in SRAM cells.
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关键词
lack ofdetectability,process scaling,bitline contacts,sram cell,high density srams,single chip,stressabilityof bitline contact,smaller sram cellschallenges process,inherent electrical characteristicsof,high-density srams,resistive bitline contact,bitline contact,robustand reliable bitline contact,contact resistance,robustness,microelectronics,chip,design for testability,environmental stress screening,stability,voltage
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