A 45-nm Dual-Port SRAM Utilizing Write-Assist Cells Against Simultaneous Access Disturbances

IEEE Trans. on Circuits and Systems(2012)

引用 22|浏览6
暂无评分
摘要
Eight-transistor (8T) dual-port static random access memory (DP-SRAM) suffers from read and write disturbances at low voltages when both ports are accessed simultaneously, and write disturbance dominates the VDDmin in high-speed applications. This brief proposes a write-assist 8T (WA8T) cell to suppress the write disturbance for DP-SRAM to achieve a lower VDDmin with low area overhead and power consumption. We fabricated a 1-Mbit DP-SRAM with WA8T testchip using a 40-nm CMOS process. The proposed WA8T device achieved a 120-mV improvement in VDDmin with less than 1% area overhead.
更多
查看译文
关键词
cmos process,write-assist 8t cell,wa8t testchip,power consumption,size 45 nm,write disturbances,low area overhead,dual-port static random access memory (dp-sram),size 40 nm,sram chips,low supply voltage,high-speed applications,8t dp-sram,eight-transistor dual-port static random access memory,voltage 120 mv,cmos digital integrated circuits,write-assist cells utilization,read disturbances
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要