Large area SiH4/H2 VHF plasma produced at high pressure using multi-rod electrode

A VHF SiH4/H-2 plasma was produced using a multi-rod electrode of 1200 mmx115 mm and the characteristics of VHF plasma at high pressure were measured with a heated Langmuir probe, where the frequency of VHF power source was 60 MHz and the power was up to 450 W. The pressure was ranged from 1 Torr to 3 Torr. When the pressure was increased, the ion saturation current density decreased independent of the concentration ratio of SiH4/H2 and the electron temperature tended to increase at high Pressures. Furthermore, when the VHF power was increased, the wall potential decreased at high pressures. (C) 2008 Elsevier B.V. All rights reserved.