High performance GaN/AlGaN MODFETs grown by RF-assisted MBE

Electronics Letters(1998)

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摘要
High performance 0.25 mu m gate-length GaN/AlGaN modulation doped field effect transistors grown by RF-assisted MBE on sapphire are demonstrated. A maximum drain current of 750mA/mm, and a breakdown voltage exceeding 45V were obtained. Small signal measurement yielded a current gain cutoff frequency of 28GHz, and a maximum oscillation frequency of 426Hz. The authors have achieved < 5% variation in the maximum drain current across 2in wafers. These results demonstrated the excellent potential of RF-assisted MBE in the growth of GaN-based microwave power devices for practical applications.
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III-V semiconductors,aluminium compounds,electric breakdown,gallium compounds,microwave field effect transistors,microwave power transistors,molecular beam epitaxial growth,power HEMT,0.25 micron,28 GHz,40 GHz,45 V,Al2O3,GaN-AlGaN,GaN/AlGaN MODFETs,RF-assisted MBE,breakdown voltage,field effect transistors,microwave power devices,modulation doped FET,sapphire substrate
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