Low energy electron beam microcolumn lithography
Microelectronic Engineering(2006)
摘要
A compact sized low energy microcolumn system has been developed for mask-less lithography application. The microcolumn has high throughput capabilities as well as high resolution using arrayed microcolumn structures. A number of arrayed microcolumn structures have been studied based on single column modules, monolithic column module, and wafer-scale column module. In this paper, a review of microcolumn studies and recent results of sub-60nm line patterning in advanced low energy microcolumn operation is presented.
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关键词
microcolumn,high resolution,arrayed microcolumn structure,microcolumn lithography,monolithic column module,low energy electron beam,high throughput capability,single column module,41.85,low energy microcolumn system,mask-less lithography application,microcolumn study,wafer-scale column module,41.75.f,maskless e-beam lithography,41.75.h,advanced low energy microcolumn,81.05.d,high throughput,electron beam
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