Opc-Free And Minimally Irregular Ic Design Style
DAC '07: Proceedings of the 44th annual Design Automation Conference(2007)
摘要
Advancements in IC manufacturing technologies allow for building very large devices with billions of transistors and with complex interactions between them encapsulated in a huge number of design rules. To ease designers' efforts in dealing with electrical and manufacturing problems, regular layout style seems to be a viable option. In this paper we analyze regular layouts in an IC manufacturability context and define their desired properties. We introduce the OPC-free IC design methodology and study properties of cells designed for this layout style that have various degrees of regularity.
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关键词
IC layout regularity,OPC-free,manufacturability,DFM,advanced technology,multiple exposure,design paradigm,VLSI
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