Opc-Free And Minimally Irregular Ic Design Style

DAC '07: Proceedings of the 44th annual Design Automation Conference(2007)

引用 18|浏览0
暂无评分
摘要
Advancements in IC manufacturing technologies allow for building very large devices with billions of transistors and with complex interactions between them encapsulated in a huge number of design rules. To ease designers' efforts in dealing with electrical and manufacturing problems, regular layout style seems to be a viable option. In this paper we analyze regular layouts in an IC manufacturability context and define their desired properties. We introduce the OPC-free IC design methodology and study properties of cells designed for this layout style that have various degrees of regularity.
更多
查看译文
关键词
IC layout regularity,OPC-free,manufacturability,DFM,advanced technology,multiple exposure,design paradigm,VLSI
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要