检索
AI 对话
AI 辅写
analysis
趋势分析
编组
开放平台
more
更多
排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
VIPCreated with Sketch.
研究兴趣

论文共 11 篇作者统计合作学者相似作者

按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
Metrology Challenge for Monitoring Post CMP Pattern Through CD SEM
Gang Wang,Yuyang Bian,Biqiu Liu, Cong Zhang,Wenzhan Zhou
2023 International Workshop on Advanced Patterning Solutions (IWAPS)pp.1-4, (2023)
引用0浏览0EIWOS引用
0
0
Dose control strategy using random logic device patterns and massive metrology in a foundry high volume manufacturing environment
Kan Zhou, Xin Guo,Yuyang Bian,Wenzhan Zhou,Yu Zhang, Ijen van Mil,Elly Shi,Robbin Zhu,Jo Zhu, Ivan Mao, Elvira Koolen,Kaiyuan Chi,
2021 International Workshop on Advanced Patterning Solutions (IWAPS)pp.1-7, (2021)
引用0浏览0EIWOS引用
0
0
Mark design challenge of cut layer in FinFet
Lulu Lai,Yuyang Bian,Shaopeng Chen,Biqiu Liu,Rui Qian,Xiaobo Guo, Cong Zhang, Jun Huang,Yu Zhang
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021)
引用1浏览0引用
1
0
The importance of in-die sampling using E-beam solution on yield improvement
Yu Zhang,Biqiu Liu, Cong Zhang,Yuyang Bian, Song Gao,Yifei Zhu,Xiaobo Guo, Jun Huang, Yaniv Abramovitz, Qiang Zhou,Uri Smolyan,Omri Baum,
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 472-477
引用1浏览0引用
1
0
Effects of lithography process conditions on unbiased line roughness by PSD analysis
Yuyang Bian,Lulu Lai, Song Gao, Dandan Hu,Xijun Guan,Biqiu Liu,Xiaobo Guo, Cong Zhang, Jun Huang,Yu Zhang, Yongyu Yuan, Yujie Xu
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 629-638
引用2浏览0引用
2
0
加载更多
作者统计
  • 合作者
  • 学生
  • 导师
暂无相似学者，你可以通过学者研究领域进行搜索筛选
数据免责声明
页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果，我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问，可以通过电子邮件方式联系我们：report@aminer.cn