Research Interests
Xiaoxing Xi’s research focuses on the materials physics underlying the applications of oxide, boride, and transition metal dichalcogenide thin films, in particular epitaxial thin films and heterostructures at the nanoscale. Using various deposition techniques including Laser Molecular Beam Epitaxy and Hybrid Physical-Chemical Vapor Deposition, his group specializes in atomic layer-by-layer growth of artificial oxide heterostructures, magnesium diboride thin films for electronic and radio frequency cavity applications, iron pnictide superconductor thin films, and thin films of 2D layered materials transition metal dichalcogenides. He has published over 350 papers in refereed journals and holds three patents in the area of thin films of high-Tc superconductors and magnesium diboride. Since 2015, he has spoken out actively for open fundamental research and against racial profiling, and received the American Physical Society 2020 Andrei Sakharov Prize for his effort.