基本信息
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Bio
Within the field of ALD, he has contributed most prominently by his work on plasma-assisted ALD, his research related to ALD for photovoltaics, and ALD for nanopatterning (including area-selective ALD). Currently, Erwin is focusing his research mostly on atomic scale processing, a field which is believed to grow in importance quickly in the next decade, for a wide variety of application domains.
Research Interests
Papers共 796 篇Author StatisticsCo-AuthorSimilar Experts
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ACS CATALYSISno. 13 (2024): 10089-10101
Marc J. M. Merkx,Ilker Tezsevin,Pengmei Yu, Thijs Janssen, Rik H. G. M. Heinemans, Rik J. Lengers,Jiun-Ruey Chen, Christopher J. Jezewski,Scott B. Clendenning,Wilhelmus M. M. Kessels,Tania E. Sandoval,Adriaan J. M. Mackus
JOURNAL OF CHEMICAL PHYSICSno. 20 (2024)
Jeff J. P. M. Schulpen, Cindy H. X. Lam,Rebecca A. Dawley, Ruixue Li,Lun Jin,Tao Ma,Wilhelmus M. M. Kessels,Steven J. Koester,Ageeth A. Bol
ACS Applied Nano Materialsno. 7 (2024): 7395-7407
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ano. 6 (2024)
ACS APPLIED NANO MATERIALSno. 16 (2024): 18786-18800
Jeff J. P. M. Schulpen, Cindy H. X. Lam,Rebecca A. Dawley, Ruixue Li,Lun Jin,Tao Ma,Wilhelmus M. M. Kessels,Steven J. Koester,Ageeth A. Bol
ACS APPLIED NANO MATERIALSno. 10 (2024): 12205-12206
The Journal of Physical Chemistry Letterspp.7496-7501, (2024)
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Author Statistics
#Papers: 796
#Citation: 29942
H-Index: 82
G-Index: 140
Sociability: 7
Diversity: 3
Activity: 66
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