Takayoshi Tsutsumi - Nagoya University

基本信息

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职业迁徙

个人简介

Takayoshi Tsutsumi received the Ph.D. degree from the Division of Engineering, Graduate School, Nagoya University, Japan, in 2015. In 2015, he joined Nagoya University, where he is currently an Assistant Professor.

研究兴趣

论文共 144 篇作者统计合作学者相似作者

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SiO2/Si Interface Oxidation and Defects in O2 Plasma Processing

Shota Nunomura,Takayoshi Tsutsumi,Masaru Hori

Applied Physics Expressno. 2 (2025): 026002

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Analysis of the Synergetic Effect of Process Parameters of Hydrogenated Amorphous Carbon Deposition in Plasma-Enhanced Chemical Vapor Deposition Using Machine Learning

Yusuke Ando,Hiroki Kondo,Takayoshi Tsutsumi,Kenji Ishikawa,Makoto Sekine,Masaru Hori

DIAMOND AND RELATED MATERIALS (2025)

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Recovery of Plasma-Induced Defects in SiO2/Si Stack: Defect Activation and Hydrogen’s Effects

Shota Nunomura,Takayoshi Tsutsumi,Masaru Hori

Applied Physics Expressno. 3 (2025): 036001

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Achieving the In-plane Orientation of Carbon Nanowalls: Implications for Sensing, Energy Harvesting, and Nanobio Devices

Shintaro Iba,Hiroki Kondo,Takayoshi Tsutsumi,Kenji Ishikawa,Mineo Hiramatsu,Masaru Hori

ACS APPLIED NANO MATERIALS (2025)

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Plasma-enhanced Atomic Layer Deposition of Carbon Films Employing a Cyclic Process of N2/H2 Plasma and Α, Α’-Dichloro-p-xylene As a Precursor

Liugang Hu,Takayoshi Tsutsumi,Nobuyoshi Kobayashi,Kenji Ishikawa,Masaru Hori

APPLIED SURFACE SCIENCE（2025）

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High-Speed Removal Process for Organic Polymers by Non-Thermal Atmospheric-Pressure Spark Discharge at Room Temperature and Its Mechanism

Yoshihiro Sakamoto,Takayoshi Tsutsumi,Hiromasa Tanaka,Kenji Ishikawa,Hiroshi Hashizume,Masaru Hori

COATINGSno. 10 (2024)

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In Situ Atom-Resolved Observation of Si (111) 7×7 Surface with F Radical and Ar Ion Irradiation Simulated Atomic Layer Etching

Takayoshi Tsutsumi,Atsuki Asano,Hiroki Kondo,Kenji Ishikawa,Makoto Sekine,Masaru Hori

Journal of Vacuum Science & Technology A Vacuum Surfaces and Filmsno. 3 (2024)

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Pseudo-Wet Plasma Mechanism Enabling High-Throughput Dry Etching of SiO2 by Cryogenic-Assisted Surface Reactions

Shih-Nan Hsiao,Makoto Sekine,Nikolay Britun, Michael K. T. Mo,Yusuke Imai,Takayoshi Tsutsumi,Kenji Ishikawa, Yuki Iijima,Ryutaro Suda, Masahiko Yokoi,Yoshihide Kihara,Masaru Hori

Small Methods (2024)

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Radical, Ion, and Photon's Effects on Defect Generation at Sio2/Si Interface During Plasma Etching

Shota Nunomura,Takayoshi Tsutsumi,Noriharu Takada,Masanaga Fukasawa,Masaru Hori

APPLIED SURFACE SCIENCE (2024)

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High-speed Synthesis and Functionalization of Nanographene by In-liquid Plasma

Hiroki KONDO,Takayoshi TSUTSUMI,Kenji ISHIKAWA,Masaru HORI,Mineo HIRAMATSU

Vacuum and Surface Scienceno. 2 (2024): 77-82

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