Theodorus E. Standaert

Theodorus E. Standaert received the M.S. degree in applied physics from Eindhoven University of Technology, The Netherlands, in 1996 and the Ph.D. degree in physics from State University of New York, Albany, in 1999. He then joined the IBM Systems and Technology Group in East Fishkill, NY. He started as a Unit Process Engineer, where he is responsible for the development of reactive ion etching processes of low-k dielectrics. He subsequently moved into process integration, where he was one of the lead engineers defining and developing the back-end of line (BEOL) for IBM's 45 nm CMOS technology. As the lead BEOL integration engineer, he also contributed to the successful product ramp of IBM's first 45 nm IBM processor. He is currently a Senior Engineer at IBM in Albany Nanotech focusing on FinFET CMOS device integration.