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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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论文共 48 篇作者统计合作学者相似作者

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Focus sensing using placement and CD variation for high NA EUV lithography
Victor Calado,Simon G. J. Mathijssen,Eelco van Setten,Jo Finders, Friso Wittebrood, Wim Bouman, Kaustuve Bhattacharyya, Willem op t Root, Elliott McNamara, Matthew McLaren
Optical and EUV Nanolithography XXXVII (2024)
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Soft X-Ray: Novel metrology for 3D profilometry and device pitch overlay
Christina Porter, Teis Coenen, Niels Geypen, Sandy Scholz, Loes van Rijswijk, Han-Kwang Nienhuys, Jeroen Ploegmakers, Johan Reinink, Hugo Cramer, Rik van Laarhoven, David O'Dwyer, Peter Smorenburg,
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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Using active asymmetry control and blind source separation to improve the accuracy of after develop overlay measurements
Jungmin Lee, Doogyu Lee,Eunji Lee, Inbeom Yim,Jeongjin Lee,Seung Yoon Lee, Chan Hwang, Marc Noot, Arno van Leest,Simon Mathijssen, Yao Gao, Seung-Bin Yang,
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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Characterization of metrology to device overlay offset and novel methods to minimize it
Kaustuve Bhattacharyya,Ken Chang, Jeff Lin,Simon Gijsbert Josephus Mathijssen, Marc Noot,Farzad Farhadzadeh, Arie Jeffrey Den Boef, Momo Lin, Frank Sun, Justin Huang,Sax Liao, Edison Wang,
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 17-22
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Accuracy aware pixel selection in multi-wavelength uDBO metrology enables higher robustness and accuracy for DRAM
Chia-Hung Chen, Sheng-Tsung Tsao,Jie Du,Wenkang Song,Hongwei Zhu,Ji-Ling Hou,Longfei Shen, Sunny Xia,Simon Gijsbert Josephus Mathijssen, Marc Noot,Farzad Farhadzadeh,Kimi Yang,
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 745-750
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Enhancing The Applications Space Of Diffraction Based Overlay Metrology By Increasing Throughput And Target Pitch Flexibility
Simon Mathijssen, Herman Heijmerikx,Farzad Farhadzadeh,Marc Noot, Lineke Van Der Sneppen,Longfei Shen, Fei Jia,Jolly Xu, Huajun Qin,Arie Den Boef, Elliott Mc Namara,Kaustuve Bhattacharyya,
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
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POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Arie Jeffrey Den Boef, Justin Lloyd Kreuzer,Simon Gijsbert Josephus Mathijssen, Gerrit Johannes Nijmeijer, Christian J Swindal, Patricius Aloysius Jacobus Tinnemans,Richard Johannes Franciscus Van Haren
mag（2015）
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