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个人简介
Worked on the research and development of ultra-precise plasma etching processes for ULSI devices.
Prof Samukawa, early in his career at NEC in Japan, recognized the importance of developing plasma processing technologies that mitigated process related device damage. His first major contribution addressed the requirement for ultralow plasma potentials and electron temperatures along with superior species flux uniformity to reduce damage. This contribution foretold the emergence of what is today’s ultrahigh frequency plasma sources, capacitively coupled VHF and microwave-based that are critical for damage-free plasma processing.
His significant scientific achievements earned him Ichimura Award (2008) in the New Technology Development Foundation, Prizes for Science and Technology; The Commendation for Science and Technology by the Minister of Education, Culture, Sports, Science and Technology (2009), Plasma Prize in American Vacuum Society (2010) and IEEE NTC Distinguished Lecturers (2019).
Prof Samukawa, early in his career at NEC in Japan, recognized the importance of developing plasma processing technologies that mitigated process related device damage. His first major contribution addressed the requirement for ultralow plasma potentials and electron temperatures along with superior species flux uniformity to reduce damage. This contribution foretold the emergence of what is today’s ultrahigh frequency plasma sources, capacitively coupled VHF and microwave-based that are critical for damage-free plasma processing.
His significant scientific achievements earned him Ichimura Award (2008) in the New Technology Development Foundation, Prizes for Science and Technology; The Commendation for Science and Technology by the Minister of Education, Culture, Sports, Science and Technology (2009), Plasma Prize in American Vacuum Society (2010) and IEEE NTC Distinguished Lecturers (2019).
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NANOMATERIALSno. 1 (2024): 95
Energiesno. 6900 (2023): 6900-6900
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2023 7TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTMpp.1-3, (2023)
Nature communicationsno. 1 (2023): 7569-7569
IEEE Open Journal of Nanotechnology (2023): 150-155
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NATURE COMMUNICATIONSno. 1 (2023)
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