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Dr. Chambers is a Laboratory Fellow and the Technical Group Leader for the PNNL Oxide Epitaxy Group. He has focused on the controlled film growth and properties of model materials and heterostructures throughout his career. His interests have ranged from metals to conventional Group IV and Group III-V semiconductors to simple and complex oxides. His current interests focus on the deposition and properties of complex metal oxide films and heterostructures. Such materials are of significant interest in a variety of scientific and technological arenas, including oxide electronics, spintronics, and photocatalysis. Of specific interest is modification of electronic, magnetic, optical, and photochemical properties by controlled doping and solid solution formation, with an eye toward novel behavior that could give rise to new and useful technologies based on oxides. His film deposition methods of choice are molecular beam epitaxy and off-axis pulsed laser deposition, assisted by activated oxygen from an oxygen plasma generator or ozone. He brings a variety of in situ and ex situ characterization methods to bear on the these materials, including high-resolution x-ray and ultraviolet photoelectron spectroscopy, x-ray diffraction, Rutherford backscattering, scanning transmission electron microscopy, electron energy loss spectroscopy, atom probe tomography and scanning probe microscopy. He also incorporates a strong theoretical modeling component by collaborating with Dr. Peter Sushko of PNNL.
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PHYSICAL REVIEW MATERIALSno. 8 (2023)
ADVANCED ENERGY MATERIALSno. 22 (2023)
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Nature communicationsno. 1 (2023): 6068-9
APL Materialsno. 7 (2022)
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